Beam Electron Lithography for Microfluid Devices Fabrication

Beam Electron Lithography for Microfluid Devices Fabrication

M. Rizwan, A. Ahmed, A.Ayub, S. Hanif, A. Munir, Alishba, M. Perveen

Electron Beam Lithography (EBL) is a high-resolution patterning method that is mostly used in nanofabrication for semiconductor devices, photonics, and bioengineering applications. Unlike optical lithography, EBL offers superior resolution by utilizing focused electron beams to define intricate nanoscale features. This chapter explores the fundamental principles of EBL, its working mechanisms, resistance systems, and key processing parameters. The advantages and limitations of EBL are discussed, along with its role in modern nanotechnology. Future advancements in the field, including improvements in throughput and hybrid lithographic approaches, are also examined.

Keywords
Electron Beam Lithography (EBL), Nanofabrication, High-Resolution Patterning, Electron-Material Interactions, Maskless Lithography, Hybrid Lithographic Techniques

Published online 6/15/2026, 32 pages

Citation: M. Rizwan, A. Ahmed, A.Ayub, S. Hanif, A. Munir, Alishba, M. Perveen, Beam Electron Lithography for Microfluid Devices Fabrication, Materials Research Foundations, Vol. 191, pp 96-127, 2026

DOI: https://doi.org/10.21741/9781644904213-4

Part of the book on Microfluidics

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