Optimization of Parameters Modeling the Angular Distribution of Ion Sputtering for the Components of Inconel 718 Alloy Using Genetic Algorithm

Optimization of Parameters Modeling the Angular Distribution of Ion Sputtering for the Components of Inconel 718 Alloy Using Genetic Algorithm

Abd El moughit BACHRAK, Tarik BOURAGBA, Kawtar BRIA, Mohammed AIT EL FQIH

Abstract. The goal of this research is to create a new method for improving the angle at which thin films are deposited using a sputter deposition process, thereby controlling how the particles will be placed to produce a uniform surface with a high-quality coating of the desired material. To accomplish this, an equation with three coefficients (n, k, ν) was developed through empirical research and is used in conjunction with the Genetic Algorithm (GA) to discover these coefficients. The GA is a method that has been shown to work effectively when used on complex nonlinear problems. It was used to optimize the angular distribution for each of the six most common elements in Inconel 718 (nickel (Ni), chromium (Cr), iron (Fe), molybdenum (Mo), aluminium (Al), niobium (Nb), and titanium (Ti)). GA optimizes calculations using simulated data combined with real experimental data with added random noise mimicking actual laboratory conditions. χ² minimization is the GA’s method for fitting the coefficients’ values (the coefficients) and has proven to produce very accurate results. For example, for the case of Fe, where the optimised value n(GA) = 0.4214 is within a few percent of the target value n = 0.4200. The coefficients k and ν vary greatly from element to element, indicating that they reflect differences in the physical processes involved in how atoms are ejected from the target material at an oblique angle. Overall, these findings support the reliability and use of the GA to fit sputtering models, which may be useful for helping to improve the uniformity and quality of thin films deposited during sputtering.

Keywords
Physical Vapor Deposition (PVD), Sputtering, Heuristic Optimization, Angular Distribution, Numerical Modeling, Refractory Metals

Published online 4/25/2026, 6 pages
Copyright © 2026 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA

Citation: Abd El moughit BACHRAK, Tarik BOURAGBA, Kawtar BRIA, Mohammed AIT EL FQIH, Optimization of Parameters Modeling the Angular Distribution of Ion Sputtering for the Components of Inconel 718 Alloy Using Genetic Algorithm, Materials Research Proceedings, Vol. 64, pp 463-468, 2026

DOI: https://doi.org/10.21741/9781644904091-58

The article was published as article 58 of the book Energy Futures

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

References
[1] P. Sigmund, Theory of sputtering. I. Sputtering yield of amorphous and polycrystalline targets, Phys. Rev. 184 (1969) 383–416. https://doi.org/10.1103/PhysRev.184.383
[2] Y. Yamamura, H. Tawara, Energy dependence of ion-induced sputtering yields from monoatomic solids at normal incidence, At. Data Nucl. Data Tables 62 (1996) 149–253. https://doi.org/10.1006/adnd.1996.0005
[3] R. Behrisch, W. Eckstein (Eds.), Sputtering by Particle Bombardment: Experiments and Computer Calculations from Threshold to MeV Energies, Springer, Berlin, 2007. https://doi.org/10.1007/978-3-540-44502-9
[4] M. Ait El Fqih, P.-G. Fournier, Ion beam sputtering monitored by optical spectroscopy, Acta Phys. Pol. A 115 (2009) 907–911. https://doi.org
[5] A. Anders, Cathodic Arcs: From Fractal Spots to Energetic Condensation, Springer, New York, 2008. https://doi.org/10.1007/978-0-387-79108-1
[6] M. Pawlak, M. Krishnan, A. Anders, Angular distribution of sputtered material in magnetron discharges, J. Appl. Phys. 101 (2007) 123302. https://doi.org
[7] D.E. Goldberg, Genetic Algorithms in Search, Optimization, and Machine Learning, Addison-Wesley, Reading, MA, 1989. https://doi.org/10.11517/jjsai.7.1_168
[8] K. Deb, Optimization for Engineering Design: Algorithms and Examples, Prentice Hall, New Delhi, 1998.
[9] C.W. White, Ion induced optical emission for surface and depth profile analysis, Nucl. Instrum. Meth. 149 (1978) 497–501. https://doi.org/10.1016/0029-554X(78)90916-3
[10] M. Ait El Fqih, P.-G. Fournier, Optical emission from Be, Cu and CuBe targets during ion beam sputtering, Nucl. Instrum. Methods B 267 (2009) 1206–1210. https://doi.org/10.1016/j.nimb.2009.01.159
[11] A. Bachrak, L. Jadoual, K. Bria, M. Ait El Fqih, Ion-induced atomic excitation in Vanadium, Revista Mexicana De Fisica, 71 (2025) 031003. https://doi.org/10.31349/RevMexFis.71.031003
[12] K. Bria, M. Ait El Fqih, J.-M. Nunzi, L. Jadoual, A. Kaddouri, Angular distribution of sputtered particles from Inconel 718: a simulation study, Eur. Phys. J. Appl. Phys. 98 (2023) 26. https://doi.org/10.1051/epjap/2023220334