Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing

Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing

Zhanfang Wu, Lida Che, Jing He, Haofeng Li, Pengjie Zhang, Xiangyang Li

Abstract. Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering target samples were prepared using Mo powder, Nb powder,Ni powder and Ti powder as raw materials by hot isostatic pressing (near net forming). The density, phase composition, microstructure and element distribution of Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtered target samples were measured by optical microscope, scanning electron microscope and energy dispersive spectrometer. The experimental results show that hot isostatic pressing can prepare Mo-Nb target at lower temperature, and the obtained samples have finer grains, higher density and more uniform element distribution than that of non-pressure sintering. High-quality Mo-Nb, Mo-Ti, Mo-Ni-Ti sputtering targets (density>99%, grain size<100 μm) were obtained by hot isostatic pressing. Keywords
Hot Isostatic Pressing, High Quality Sputtering Target, Powder Metallurgy, Density, Grain Size

Published online 12/8/2023, 7 pages
Copyright © 2023 by the author(s)
Published under license by Materials Research Forum LLC., Millersville PA, USA

Citation: Zhanfang Wu, Lida Che, Jing He, Haofeng Li, Pengjie Zhang, Xiangyang Li, Preparation of High-Quality Mo-Nb (Ti/Ni-Ti) Sputtering Target by Hot Isostatic Pressing, Materials Research Proceedings, Vol. 38, pp 113-119, 2023

DOI: https://doi.org/10.21741/9781644902837-17

The article was published as article 17 of the book Hot Isostatic Pressing

Content from this work may be used under the terms of the Creative Commons Attribution 3.0 license. Any further distribution of this work must maintain attribution to the author(s) and the title of the work, journal citation and DOI.

References
[1] Z.Q. Chu. The present status and development trend of magnetron sputtering target, J. Metal Materials and Metallurgy Engineering, 39(2011) 44-49.
[2] Z.Y. Shang, X. Jiang, Y.J. Li. Integrated circuit manufacturing sputtering target, J. Rare Metals, 29(2005) 475-477.
[3] H. Wang, M. Xia, Y. Li, X. Liu, X. Cai. Application and preparation technology of refractory metal sputtering target, China Molybdenum Industry, 34(2019) 64-67.
[4] [4] B.H. Zhao, H.B. Fan, J Sun. TFT-LCD source for producing molybdenum thin film sputtering and target, J. China Molybdenum Industry,35 (2011) 7-11.
[5] X.M. Dang, G. An, J. Li. Effect of niobium powder granularity and sintering method on Mo-Nb alloy, J. Powder Metallurgy Industry, 34(2016) 271-276.
[6] Y. P. Ning, W. Wang, Y. Sun. Effects of substrates, film thickness and temperature on thermal emittance of Mo/substrate deposited by magnetron sputtering, J. Vacuum.128 (2016)73-79. https://doi.org/10.1016/j.vacuum.2016.03.008
[7] F. Yang, K.S. Wang, P. Hu. research status and development trend of high-purity molybdenum sputtering targets, J. Thermal Processing, 39(2013) 10-12.
[8] G. An, J. Sun, R. Liu, J. Li, W. Cao. Study on microstructure and properties of Mo thin films sputtered by two kind of Mo targets, J. Material Sciences, 8(2018) 709-717. https://doi.org/10.12677/MS.2018.86084
[9] [9] H.L. Liu, M. Bai, G.T. Sun. Basic performance research and reapplication development of molybdenum target after magnetron sputtering, J. China Resources Comprehensive Utilization, 10(2021) 73-79.
[10] B. Williams, F.L. Han. Recent trends in Hot Isostatic Pressing (HIP): Processing and application, J. Powder Metallurgy Industry, 32(2014) 464-468.
[11] T. K. Roy, A. Awasthi, N. Krishnamurthy. Studies on sacrificial and carbon deoxidation of niobium, J.International Journal of Refractory Metals & Hard Materials 004(22): 251-256. https://doi.org/10.1016/j.ijrmhm.2004.08.002
[12] H.S. Huang, H. C. Tung, C. Chao. Correlating fabrication processes to the microstructure and deposition properties of Mo sputtering targets, J. China Steel Technical Report, 26(2013): 59-66.